PSX303
- 1.5 times the productivity *7
Description
High productivity plasma cleaner
Specifications
| Model No. | KXF-927D |
| Productivity *1 | 360 Boards per hour (when gold is etched 5nm) |
| Substrate dimensions |
|
| Substrate thickness | 0.5 mm to 2.0 mm |
| Cleaning method | RF parallel electrode type |
| Gas for electrical discharge *2 | Ar (option: O2) |
| Electric source *3 | 1-phase AX 200V, 2.0 kVA (full load 5.00 kVA) |
| Pneumatic source | 0.5 MPa, 6.5 l/min (A.N.R.) |
| Dimensions *4 | W 1,764 mm x D 1,045 mm x H 1,430 mm *5 |
| Mass *6 | 800 kg |
Downloads
*1: In case of processing at three row substrates*2: If an optional oxygen gas is choosen as discharging gas, nitrogren gas is also required*3: Also supports 1-phase 208/220V*4: Tolerance 5mm*5: Excluding the touch panel and the signal tower*6: Varies with unit configuration*7: Comparison with PC30B-HS (KXF-919D)